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Press release · January 7, 2026 · prnewswire.co.uk

Paragraf earns Frost & Sullivan 2025 European recognition

Summary

Paragraf earned Frost & Sullivan’s 2025 European Technology Innovation Leadership Recognition for its work in graphene-based electronics manufacturing and for contributions tied to semiconductor innovation, product scalability and customer impact.

Frost & Sullivan applied a benchmarking process that assessed strategy effectiveness and strategy execution; its review concluded Paragraf aligned its strategy with evolving semiconductor demands and executed with efficiency, consistency and scale.

Paragraf developed a direct, contaminant-free graphene deposition method that grew graphene directly on standard semiconductor industry substrates and presented that approach as commercially viable and scalable. The company described a proprietary manufacturing process that combined materials science with existing semiconductor infrastructure and operates a dedicated graphene device foundry.

The organisation reported mass-production capability through its dedicated graphene device foundry and described outcomes including smaller, faster and more energy-efficient devices enabled by integrating graphene into standard semiconductor processes. Paragraf also described providing high-quality graphene integratable with standard semiconductor tool process lines.

“Frost & Sullivan praises Paragraf for its strategic approach to expanding global reach while maintaining a clear, disciplined focus on sustainable growth and lasting customer impact,” said Jabez Mendelson, Research Manager at Frost & Sullivan. “Paragraf is delighted to earn this acknowledgement from Frost & Sullivan,” said Simon Thomas, CEO and Co-Founder of Paragraf.

Paragraf said it expects graphene and other two-dimensional materials to be integrated into next-generation electronics and described a roadmap intended to support that integration.

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